Rahul R. Nair;文才 任;Rashid Jalil;Ibtsam Riaz;Vasyl G. Kravets;Liam Britnell;Peter Blake;Fredrik Schedin;Alexander S. Mayorov;Shengjun Yuan;Mikhail I. Katsnelson;会明 成;Wlodek Strupinski;Lyubov G. Bulusheva;Alexander V. Okotrub;Irina V. Grigorieva;Alexander N. Grigorenko;Kostya S. Novoselov;Andre Geim
University of Manchester;China Association for Science and Technology;Radboud University Nijmegen;Institute of Electronic Materials Technology;RAS - Nikolaev Institute of Inorganic Chemistry; Siberian Branch
A stoichiometric derivative of graphene with a fluorine atom attached to each carbon is reported. Raman, optical, structural, micromechanical, and transport studies show that the material is qualitatively different from the known graphene-based nonstoichiometric derivatives. Fluorographene is a high-quality insulator (resistivity >1012 Ω) with an optical gap of 3 eV. It inherits the mechanical strength of graphene, exhibiting a Young's modulus of 100 N m-1 and sustaining strains of 15%. Fluorographene is inert and stable up to 400 °C even in air, similar to Teflon. Fluorination of graphene yields a stoichiometric derivative of graphene with a fluorine atom attached to each carbon. Fluorographene is an optically transparent, high-quality insulator with a mechanical strength and elasticity, matching those of graphene. It is inert and thermally stable, similar to Teflon.